A Hybrid Approach for Detection and Correction of Transient Faults in SoCs

Critical applications based on Systems-on-Chip (SoCs) require suitable techniques that are able to ensure a sufficient level of reliability. Several techniques have been proposed to improve fault detection and correction capabilities of faults affecting SoCs. This paper proposes a hybrid approach able to detect and correct the effects of transient faults in SoC data memories and caches. The proposed solution combines some software modifications, which are easy to automate, with the introduction of a hardware module, which is independent of the specific application. The method is particularly suitable to fit in a typical SoC design flow and is shown to achieve a better trade-off between the achieved results and the required costs than corresponding purely hardware or software techniques. In fact, the proposed approach offers the same fault-detection and -correction capabilities as a purely software-based approach, while it introduces nearly the same low memory and performance overhead of a purely hardware-based on

Hard-to-Detect Fault Analysis in FinFET SRAMs

Manufacturing defects can cause hard-to-detect (HTD) faults in fin field-effect transistor (FinFET) static random access memories (SRAMs). Detection of these faults, such as random read outputs and out-of-spec parametric deviations, is essential when testing FinFET SRAMs. Undetected HTD faults result in test escapes, which lead to early in-field failures. This article presents a detailed analysis of HTD faults in FinFET SRAMs by exploring their sensitization and discussing solutions to improve HTD fault coverage during manufacturing testing. We first define the fault space for SRAMs and classify all faults in the space. Following this, we perform a systematic fault analysis based on injecting resistive defects in a memory cell, inspecting its behavior, and identifying HTD faults. Furthermore, we survey existing test solutions and discuss their HTD fault coverage and limitations. Based on our analysis, it is clear that no single test solution can fully detect all HTD faults, thus leading to test escapes. Hence, there is a need for new and more efficient test solutions. Improved detection of HTD faults could be achieved by using parametric test solutions, proposing solutions that cover yet-untargeted HTD faults, combining multiple test approaches into a single solution, and further exploring stress conditions. These new approaches would reduce test escapes and therefore improve the quality of FinFET SRAMs

DFT Scheme for Hard-to-Detect Faults in FinFET SRAMs

Hard-to-detect faults such as weak and random faults in FinFET SRAMs represent an important challenge for manufacturing testing in scaled technologies, as they may lead to test escapes. This paper proposes a Design-for-Testability (DFT) scheme able to detect such faults by monitoring the bitline swing of FinFET memories. Using only five operations per cell, we are able to detect defects that cause deterministic, random, and weak faults. Compared to the state of the art, this leads to an improved detection capability at reduced area overhead.Accepted author manuscriptComputer EngineeringQuantum & Computer Engineerin

Hard-to-Detect Fault Analysis in FinFET SRAMs

Manufacturing defects can cause hard-to-detect (HTD) faults in fin field-effect transistor (FinFET) static random access memories (SRAMs). Detection of these faults, such as random read outputs and out-of-spec parametric deviations, is essential when testing FinFET SRAMs. Undetected HTD faults result in test escapes, which lead to early in-field failures. This article presents a detailed analysis of HTD faults in FinFET SRAMs by exploring their sensitization and discussing solutions to improve HTD fault coverage during manufacturing testing. We first define the fault space for SRAMs and classify all faults in the space. Following this, we perform a systematic fault analysis based on injecting resistive defects in a memory cell, inspecting its behavior, and identifying HTD faults. Furthermore, we survey existing test solutions and discuss their HTD fault coverage and limitations. Based on our analysis, it is clear that no single test solution can fully detect all HTD faults, thus leading to test escapes. Hence, there is a need for new and more efficient test solutions. Improved detection of HTD faults could be achieved by using parametric test solutions, proposing solutions that cover yet-untargeted HTD faults, combining multiple test approaches into a single solution, and further exploring stress conditions. These new approaches would reduce test escapes and therefore improve the quality of FinFET SRAMs.Computer EngineeringQuantum & Computer Engineerin

Detecting Random Read Faults to Reduce Test Escapes in FinFET SRAMs

Manufacturing defects in FinFET SRAMs can cause hard-to-detect faults such as Random Read Faults (RRFs). Detection of RRFs is not trivial, as they may not lead to incorrect outputs. Undetected RRFs become test escapes, which might lead to no-trouble-found devices and early in-field failures. Therefore, the detection of RRFs is of utmost importance. This paper proposes test solutions to detect RRFs and reduce test escapes. To achieve this, we first statistically analyze the failure rate due to RRFs, followed by an experimental study of stress conditions’ (SCs) impact on detecting RRFs, such as test algorithms, supply voltage, and temperature. Based on the results, we propose a new Design-For-Testability (DFT) scheme for FinFET SRAMs to detect such faults using SCs that improve the detection rate of RRFs. This scheme introduces a negligible area and test time overhead while significantly enhancing RRF detection. Hence, using the proposed DFT leads to reduced test escapes and, consequently, higher-quality FinFET SRAMs.Computer EngineeringQuantum & Computer Engineerin

Review of Manufacturing Process Defects and Their Effects on Memristive Devices

Complementary Metal Oxide Semiconductor (CMOS) technology has been scaled down over the last forty years making possible the design of high-performance applications, following the predictions made by Gordon Moore and Robert H. Dennard in the 1970s. However, there is a growing concern that device scaling, while maintaining cost-effective production, will become infeasible below a certain feature size. In parallel, emerging applications including Internet-of-Things (IoT) and big data applications present high demands in terms of storage and computing capability, combined with challenging constraints in terms of size, power consumption and response latency. In this scenario, memristive devices have become promising candidates to complement the CMOS technology due to their CMOS manufacturing process compatibility, great scalability and high density, zero standby power consumption and their capacity to implement high density memories as well as new computing paradigms. Despite these advantages, memristive devices are also susceptible to manufacturing defects that may cause unique faulty behaviors that are not seen in CMOS, increasing significantly the complexity of test procedures. This paper provides a review about the manufacturing process of memristives devices, focusing on Valence Change Mechanism (VCM)-based memristive devices, and a comparative analysis of the CMOS and memristive device manufacturing processes. Moreover, this paper identifies possible manufacturing failure mechanisms that may affect these novel devices, completing the list of the already known mechanisms, and provides a discussion about possible faulty behaviors. Note that the identification of these mechanisms provides insights regarding the possible memristive devices’ defective behaviors, enabling to derive more accurate fault models and consequently, more suitable test procedures

Improving the Detection of Undefined State Faults in FinFET SRAMs

Manufacturing defects in FinFET SRAMs can cause hard-to-detect faults such as Undefined State Faults (USFs). Detection of USFs is not trivial, as they may not lead to incorrect functionality. Nevertheless, undetected USFs may have a severe impact on the memory's quality: they can cause random read outputs, which might lead to test escapes and no-trouble-found devices later when the device is already in the field, as well as compromise the circuit's quality by reducing the memory cell's Static Noise Margin (SNM). Therefore, the detection of USF is critical. This paper proposes a test solution to improve the detection of USFs in FinFET SRAMs. To achieve this, we first analyze the impact of USFs on the cell's SNM and bitline swing during read operations. Then, we perform an experimental study of stress conditions' (SCs) impact on sensitizing and detecting USFs. Finally, we propose a dedicated Design-For-Testability (DFT) scheme for FinFET SRAMs to detect such faults. This scheme introduces a small area overhead while significantly improving USF detection. Hence, using the proposed DFT leads to fewer test escapes and higher-quality FinFET SRAMs.Computer EngineeringQuantum & Computer Engineerin